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| Title: | HYDROGEN BEHAVIOR AND COLORATION OF TUNGSTEN OXIDE FILMS PREPARED BY MAGNETRON SPUTTERING AND PULSED LASER DEPOSITION | |
| DOI No: | 10.1142/9789812838025_0021 | |
| Source: | MATERIALS ISSUES IN A HYDROGEN ECONOMY (pp 221-228) | |
| Author(s): | SHINJI NAGATA
Work partially supported by a Grant-in-Aid for Scientific Research (C) No. 18560789 from the Japan Society for the Promotion of Science. Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan BUN TSUCHIYA Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan TATSUO SHIKAMA Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan AICHI INOUYE Japan Atomic Energy Agency, Takasaki 370-1292, Japan SHUNYA YAMAMOTO Japan Atomic Energy Agency, Takasaki 370-1292, Japan |
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| Abstract: | The relation between hydrogen and gasochromic properties were investigated by measuring simultaneously hydrogen concentration depth profiles and optical absorption in tungsten oxide films prepared by RF magnetron sputtering and pulsed laser deposition. A large amount of hydrogen was contained in the amorphous WO3 films prepared by the both methods. The excellent gasochromic properties were found in amorphous HxWO3 films with the maximum value of x about 0.8, while poorer coloration was observed in the films with less hydrogen. Under hydrogen exposure, hydrogen concentration increased with increasing the optical absorption in the wavelength of 600 – 1000 nm. | |
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